Chemical vapor deposition (CVD) is a method to make several gases produce solid by thermochemical reaction at high temperature. Plasma chemical vapor deposition (PCVD) is a method to excite the working substance to plasma state by energy excitation, so as to trigger chemical reaction to produce solid. Plasma chemical vapor deposition (PCVD) has been widely used because of its high energy density, high concentration of active ions, low deposition temperature, low energy consumption and no pollution.

Microwave plasma has the advantages of clean plasma and low impurity concentration. Therefore, microwave plasma chemical vapor deposition (MPCVD) has become the preferred method to prepare high-quality diamond, and is also one of the most promising deposition methods of high-quality diamond (single crystal and polycrystalline).

Schematic diagram of reaction chamber of MPCVD equipment

Diamond has excellent mechanical, electrical, optical, thermal and acoustic properties, and is widely used in many fields. The realization of these applications depends largely on highly oriented and single crystal diamond and large area transparent diamond film. It is difficult to obtain highly oriented and single crystal diamond and large area transparent diamond film because of the defects in diamond growth and the difficulty of obtaining uniform temperature field in large area. Therefore, the biggest challenge and difficulty in diamond research is how to prepare high quality single crystal and polycrystalline diamond samples.

Based on cyrannus? Multi antenna coupling patent technology, iplas solves the limitations of traditional single antenna plasma technology. Cyrannus? Technology adopts multiple antennas outside the cavity to ensure the stable generation of plasma in the center of the cavity, reduce the source of impurities and improve the crystal purity (the purity of diamond single crystal can reach VVS level or above).

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MPCVD system can synthesize jewelry grade diamond

At the same time, the stable microwave generator is also easy to control, which can excite high stability plasma in the range of 10mbar to room pressure, and minimize the change of plasma state caused by the fluctuation of gas flow, gas pressure, gas composition, voltage and other factors, so as to ensure the continuity of single crystal growth and provide a strong guarantee for the synthesis of large-size single crystal diamond and thin film.

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High quality and large size diamond films can be synthesized by MPCVD system

MPCVD is also suitable for thin film deposition and crystal synthesis of other hard materials such as Al2O3 and c-BN with planar substrate or curved particles. With decades of accumulation in the field of plasma technology, Germany iplas can provide users with highly customized equipment to meet their different application needs.